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Publikācija: Surface Morphology of Single and Multi-Layer Silicon Nitride Dielectric Nano-Coatings on Silicon Dioxide and Polycrystalline Silicon

Publication Type Scientific article indexed in SCOPUS or WOS database
Funding for basic activity Research project
Defending: ,
Publication language English (en)
Title in original language Surface Morphology of Single and Multi-Layer Silicon Nitride Dielectric Nano-Coatings on Silicon Dioxide and Polycrystalline Silicon
Field of research 2. Engineering and technology
Sub-field of research 2.5 Materials engineering
Research platform Materials, Processes, and Technologies
Authors Līga Avotiņa
Elina Pajuste
Marina Romanova
Gennady Enichek
Aleksandrs Zaslavskis
Valentina Kinerte
Jūris Avotiņš
Jurijs Dehtjars
Gunta Ķizāne
Keywords Atomic force microscopy, Electron microscopy, Silicon nitride, Surface morphology
Abstract Silicon nitride (Si3N4) in a form of single and multi-layer nanofilms is proposed to be used as a dielectric layer in nanocapacitors for operation in harsh environmental conditions. Characterization of surface morphology, roughness and chemical bonds of the Si3N4 coatings has an important role in production process as the surface morphology affects the contact surface with other components of the produced device. Si3N4 was synthesized by using low pressure chemical vapour deposition method and depositing single and multi-layer (3 – 5 layers) nanofilms on SiO2 and polycrystalline silicon (PolySi). The total thickness of the synthesized nanofilms was 20 – 60 nm. Surface morphology was investigated by means of scanning electron microscopy (SEM) and atomic force microscopy (AFM). Chemical bonds in the layers were identified by means of Fourier transform infrared spectrometry, attenuated total reflection (FTIR-ATR) method. (From the SEM and AFM images it was estimated that both single and multi-layer coatings are deposited homogenously. Si-N breathing and stretching modes are observed in FTIR spectra and the surface morphology is highly dependent on PolySi, therefore suggesting the decrease of the roughness of the bottom electrode for use in the nanocapacitors.
DOI: 10.5755/j01.ms.26.1.21479
Reference Avotiņa, L., Pajuste, E., Romanova, M., Enichek, G., Zaslavskis, A., Kinerte, V., Avotiņš, J., Dehtjars, J., Ķizāne, G. Surface Morphology of Single and Multi-Layer Silicon Nitride Dielectric Nano-Coatings on Silicon Dioxide and Polycrystalline Silicon. Medžiagotyra, 2020, Vol. 26, No. 1, pp. 25-29. ISSN 1392-1320. e-ISSN 2029-7289. Available from: doi:10.5755/j01.ms.26.1.21479
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