Estimation of Structural Stability of Tungsten-Boron Thin Films at Elevated Temperatures

24th International Conference-School "Advanced Materials and Technologies": Book of Abstracts 2022
Līga Avotiņa, Annija Elizabete Goldmane, Edgars Vanags, Aija Trimdale-Deksne, Lada Bumbure, Marina Romanova, Hermanis Sorokins, Alexei Muhin, Aleksandrs Zaslavskis, Gunta Kizane, Jurijs Dehtjars

Structural stability of W-B films deposited on Si/SiO2 substrates by magnetron sputtering technique was studied. The films were oxidized in a thermal analysis device. Properties of the films before and after thermal treatment were studied using FTIR, XRD, SEM and EDX techniques.

Keywords
tungsten, boron, thin films, FTIR
Hyperlink
https://www.ebooks.ktu.lt/eb/1600/advanced-materials-and-technologies-book-of-abstracts-of-24th-international-conference-school/

Avotiņa, L., Goldmane, A., Vanags, E., Trimdale-Deksne, A., Bumbure, L., Romanova, M., Sorokins, H., Muhin, A., Zaslavskis, A., Kizane, G., Dehtjars, J. Estimation of Structural Stability of Tungsten-Boron Thin Films at Elevated Temperatures. In: 24th International Conference-School "Advanced Materials and Technologies": Book of Abstracts, Lithuania, Palanga, 22-26 August, 2022. Kaunas: Kaunas University of Technology, 2022, pp.38-38. e-ISSN 2669-1930.

Publication language
English (en)