The study examined information on the textile surface modification of materials with a thin layer. It is a promising technology in the textile functionalization, allowing the creation of metallic, oxide, polymer composites and coatings for textile materials. The process gives the unique features to textile and also is given the necessary additional features. A more productive method is sputtering. In jon sputtering deposited matter particles are broken from the target surface, the bombing of low temperature ion plasma. Ion sputtering types is the cathode, magnetron, reactive magnetron, etc., which differ from one another by low-temperature plasma distribution space. If the sputtering process is of chemical reagents (gas phase) in the presence, then the sample surface is formed by the interaction sputtering substances in products (such as oxides, nitrides). This is called a reactive sputtering. Reactive magnetron sputtering used to sputter films of chemical compounds, mainly oxides and nitride. Entering the vacuum chamber, argon, accompanied by dosing the amount of these reactive gases: oxygen or nitrogen. Particular attention is paid to the purity of the reagents and the airtight chamber, which could impair the results obtained by sputtering. [8]. Magnetron sputtering major advantage over other textile surface coating production methods: 1) even the most difficult melting materials are easily to sputter, 2) the resultant coating films have better adhesion to the materials; 3) high sputtering rate at low operating voltage (300-700 V) and at low working gas pressures (5 ∙10 -4 - 1 ∙ 10-2 Торр); 4) deposition high purity, 5) possible to obtain a uniform thickness layer on a large-area substrates [8], 6) layer thickness, composition, structure and smoothness is easy to control the adaptation parameters of sputtering process the properties of the material.