Investigation of Deep Level Defects in CdTe Thin Films
AIP Conference Proceedings: 27th International Conference on Defects in Semiconductors (ICDS-2013) 2013
H. Shankar, A. Castaldini, E. Diéguez, Edvīns Daukšta, Artūrs Medvids, S. Rubio, A. Cavallini

In the past few years, a large body of work has been dedicated to CdTe thin film semiconductors, as the electronic and optical properties of CdTe nanostructures make them desirable for photovoltaic applications. The performance of semiconductor devices is greatly influenced by the deep levels. Knowledge of parameters of deep levels present in as-grown materials and the identification of their origin is the key factor in the development of photovoltaic device performance. Photo Induced Current Transient Spectroscopy technique (PICTS) has proven to be a very powerful method for the study of deep levels enabling us to identify the type of traps, their activation energy and apparent capture cross section. In the present work, we report the effect of growth parameters and LASER irradiation intensity on the photo-electric and transport properties of CdTe thin films prepared by Close-Space Sublimation method using SiC electrical heating element. CdTe thin films were grown at three different source temperatures (630, 650 and 700 °C). The grown films were irradiated with Nd:YAG LASER and characterized by Photo-Induced Current Transient Spectroscopy, Photocurrent measurementand Current Voltage measurements. The defect levels are found to be significantly influenced by the growth temperature.


Keywords
deep level defects, CdTe, thin films
DOI
10.1063/1.4865623
Hyperlink
http://scitation.aip.org/content/aip/proceeding/aipcp/10.1063/1.4865623

Shankar, H., Castaldini, A., Diéguez, E., Daukšta, E., Medvids, A., Rubio, S., Cavallini, A. Investigation of Deep Level Defects in CdTe Thin Films. In: AIP Conference Proceedings: 27th International Conference on Defects in Semiconductors (ICDS-2013), Italy, Bologna, 21-26 July, 2013. Melville: American Institute of Physics, 2013, pp.145-149. ISBN 978-0-7354-1215-6. ISSN 0094-243X. e-ISSN 1551-7616. Available from: doi:10.1063/1.4865623

Publication language
English (en)
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