TiO2 Formation on Ti Substrate by Plasma Immersion Ion Implantation
17th International Conference on Global Research and Education (Inter-Academia 2018): Programme and Abstracts
2018
Artūrs Medvids,
Līga Orlova,
Aleksandrs Mičko,
S. Varnagiris,
H. Mimura,
D. Milčius,
Edvīns Ļetko,
Sergejs Gaidukovs,
Artūrs Plūdons,
Pāvels Onufrijevs
Plasma Immersion Ion Implantation (PIII) was used to form TiO2 layer on titanium substrate.
The influence of PIII treatment time from 1 to 3 hours on properties of TiO2 layer structure was
studied. It was found that at longer treatment time anatase phase crystal concentration in TiO2 film
has increased. Crystalline phases and morphology of the obtained film were characterized by XRD,
SEM, AFM and Raman spectroscopy. Photocatalytic decomposition ratio and surface energy in
obtained TiO2 films were evaluated. First order reaction constant increased from 3.2×10-3 min -1 to
4.2×10-3 min-1 and surface free energy increased from 39.0 mN/m to 49.5 mN/m with increasing of
PIII treatment time.
Keywords
TiO2, Plasma Immersion, Ion Implantation, Photocatalytic Properties
Medvids, A., Grase, L., Mičko, A., Varnagiris, S., Mimura, H., Milčius, D., Ļetko, E., Gaidukovs, S., Plūdons, A., Onufrijevs, P. TiO2 Formation on Ti Substrate by Plasma Immersion Ion Implantation. In: 17th International Conference on Global Research and Education (Inter-Academia 2018): Programme and Abstracts, Lithuania, Kaunas, 24-27 September, 2018. Kaunas: 2018, pp.71-71.
Publication language
English (en)