The influence of strongly absorbing N¬2 laser radiation on pores formation on a surface of Si single crystal has been investigated using optical microscope, atomic force microscope and photoluminescence. After irradiation by the laser and subsequent electrochemical etching in HF acid solution morphological changes of the irradiated parts of a surface of Si were not observed. At the same time, pores formation on the non-irradiated parts of Si surface took place. The porous part of the Si surface is characterized by strong photoluminescence in red part of spectra with maximum at 1.88 eV and intensity of photoluminescence increases with current density. Suppression of the pores formation by the laser radiation is explained with inversion of Si type conductivity from p-type to n-type. This fact is explained by Thermogradient effect – generation and redistribution of the intrinsic defects in gradient of temperature. It was shown that the depth of n-Si layer on p-Si substrate depends on intensity of laser radiation and it increases with intensity of laser radiation. The results of the investigation can be used for optical recording and storage of information on surface of semiconductors.