Graphene-Containing Para Aramid Fabric Coating via Surfactant Assisted Exfoliation of Graphite
Materials Today: Proceedings: 2nd International Symposium on Advanced Functional Materials 2023
Silvija Kukle, Ieva Baķe, Līga Rampāne

Based on existing industrial knowledge and equipment, liquid exfoliation is probably the most viable option for expanding graphene practical application fields. The method’s principal attraction is a scalable process where pristine graphite is subjected to a solvent treatment enabling the creation of graphene dispersion suitable for end applications without transition processes. The challenge is that graphene has a limited disperse ability even in solvents suitable for it, which is due to its small mixing potential and strong π-π attraction between twodimensional graphite structures. The article discusses the possibilities of using an organic biodegradable solvent derived from natural cellulose residues Cyrene (dihydrolevoglikosenone) as a base solvent to create a liquid graphite exfoliation medium. Since the objective of obtaining graphene dispersion suitable for textile surface modification was not achieved, triethanolamine was added as a result of the search for solutions to improve the performance of the liquid medium. Several technological sequences have been developed and a comparative analysis is presented based on stereomicroscopy observations, micrographs, graphene flakes lateral dimension analysis and evaluation of dispersion adhesion intensity on the fibres of para-aramid fabric.


Atslēgas vārdi
Cyrene, Graphene, Liquid Phase Exfoliation, Surfactants, Para Aramid Fibres
DOI
10.1016/j.matpr.2023.09.131
Hipersaite
https://www.sciencedirect.com/science/article/pii/S2214785323048022?via%3Dihub

Kukle, S., Baķe, I., Rampāne (Ābele), L. Graphene-Containing Para Aramid Fabric Coating via Surfactant Assisted Exfoliation of Graphite. No: Materials Today: Proceedings: 2nd International Symposium on Advanced Functional Materials, Malaizija, Kuala Lumpur, 16.-17. februāris, 2023. Amsterdam [etc.]: Elsevier, 2023, 1.-8.lpp. ISSN 2214-7853. Pieejams: doi:10.1016/j.matpr.2023.09.131

Publikācijas valoda
English (en)
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