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Publikācija: TiO2 Formation on Ti Substrate by Plasma Immersion Ion Implantation

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Nosaukums oriģinālvalodā TiO2 Formation on Ti Substrate by Plasma Immersion Ion Implantation
Pētniecības nozare 1. Dabaszinātnes
Pētniecības apakšnozare 1.3. Fizika un astronomija
Autori Artūrs Medvids
Līga Grase
Aleksandrs Mičko
S. Varnagiris
H. Mimura
D. Milčius
Edvīns Ļetko
Sergejs Gaidukovs
Artūrs Plūdons
Pāvels Onufrijevs
Atslēgas vārdi TiO2, Plasma Immersion, Ion Implantation, Photocatalytic Properties
Anotācija Plasma Immersion Ion Implantation (PIII) was used to form TiO2 layer on titanium substrate. The influence of PIII treatment time from 1 to 3 hours on properties of TiO2 layer structure was studied. It was found that at longer treatment time anatase phase crystal concentration in TiO2 film has increased. Crystalline phases and morphology of the obtained film were characterized by XRD, SEM, AFM and Raman spectroscopy. Photocatalytic decomposition ratio and surface energy in obtained TiO2 films were evaluated. First order reaction constant increased from 3.2×10-3 min -1 to 4.2×10-3 min-1 and surface free energy increased from 39.0 mN/m to 49.5 mN/m with increasing of PIII treatment time.
Atsauce Medvids, A., Grase, L., Mičko, A., Varnagiris, S., Mimura, H., Milčius, D., Ļetko, E., Gaidukovs, S., Plūdons, A., Onufrijevs, P. TiO2 Formation on Ti Substrate by Plasma Immersion Ion Implantation. No: 17th International Conference on Global Research and Education (Inter-Academia 2018): Programme and Abstracts, Lietuva, Kaunas, 24.-27. septembris, 2018. Kaunas: 2018, 71.-71.lpp.
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ID 28613