XPS, FTIR and Photoelectron Emission Spectroscopies to Analyze Nanocapacitor Silicon Nitride Nano Layered Structures
2nd International Conference on Nanomaterials Science and Mechanical Engineering: Book of Abstracts
2019
Mindaugas Andrulevičius,
Līga Avotiņa,
Jurijs Dehtjars,
Gennady Enichek,
Marina Romanova,
Evgeny Shulzinger,
Hermanis Sorokins,
Sigitas Tamulevičius,
Aleksandrs Viļķens,
Aleksandr Zaslavski
The purpose of this study was to identify the influence of the number of dielectric Si3N4 nanolayers on the quality of nanocapacitors.
Atslēgas vārdi
silicon nitride, nanocapacitor, capacitor
Hipersaite
http://icnmsme2019.web.ua.pt/wp-content/uploads/2019/07/ICNMSME2019.pdf
Andrulevičius, M., Avotiņa, L., Dehtjars, J., Enichek, G., Romanova, M., Shulzinger, E., Sorokins, H., Tamulevičius, S., Viļķens, A., Zaslavski, A. XPS, FTIR and Photoelectron Emission Spectroscopies to Analyze Nanocapacitor Silicon Nitride Nano Layered Structures. No: 2nd International Conference on Nanomaterials Science and Mechanical Engineering: Book of Abstracts, Portugāle, Aveiro, 9.-12. jūlijs, 2019. Aveiro: 2019, 106.-106.lpp. ISBN 978-972-789-544-1.
Publikācijas valoda
English (en)